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Proceedings Paper

Author(s): James Alexander Liddle; Myrtle I. Blakey; Kevin J. Bolan; Reginald C. Farrow; Linus A. Fetter; Leslie C. Hopkins; Harold A. Huggins; Herschel M. Marchman; Milton L. Peabody Jr.; Wayne M. Simpson; Regine G. Tarascon-Auriol; Pat G. Watson
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Paper Abstract

The concept of a mask for a projection electron-beam lithography, based on the difference in scattering between two electron transparent materials -- SCALPELTM, has been demonstrated previously. In order to translate this initial proof-of-concept int a mask suitable for a real lithography system, it is necessary to address a large number of issues. Because of the thin membranes employed, the design of the mask, its fabrication, robustness and dimensional stability are critical issues. Cleaning and repair strategies are also affected by the mask structure. Patterning, inspection and metrology are also vital to the production of a viable mask, but these are areas of importance common to all advanced lithographies.

Paper Details

Date Published: 7 December 1994
PDF: 10 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195844
Show Author Affiliations
James Alexander Liddle, AT&T Bell Labs. (United States)
Myrtle I. Blakey, AT&T Bell Labs. (United States)
Kevin J. Bolan, AT&T Bell Labs. (United States)
Reginald C. Farrow, AT&T Bell Labs. (United States)
Linus A. Fetter, AT&T Bell Labs. (United States)
Leslie C. Hopkins, AT&T Bell Labs. (United States)
Harold A. Huggins, AT&T Bell Labs. (United States)
Herschel M. Marchman, AT&T Bell Labs. (United States)
Milton L. Peabody Jr., AT&T Bell Labs. (United States)
Wayne M. Simpson, AT&T Bell Labs. (United States)
Regine G. Tarascon-Auriol, AT&T Bell Labs. (United States)
Pat G. Watson, AT&T Bell Labs. (United States)

Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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