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Proceedings Paper

Importance of mask technical specifications on the lithography error budget
Author(s): Gary C. Escher
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Paper Abstract

The Semiconductor Industry Association (SIA) has identified a fifteen year roadmap of lithography requirements for gigabit device generations and beyond. Several lithography methods have been identified to meet the projected overlay, critical dimension control, and defectivity targets. Error budgets are useful in determining the overall capability of a new technology based on sub-component performance. Baseline error budget models used by the SIA Lithography roadmap committee are presented to highlight critical technology improvement areas, with emphasis on current and future mask capabilities.

Paper Details

Date Published: 7 December 1994
PDF: 12 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195839
Show Author Affiliations
Gary C. Escher, SEMATECH (United States)

Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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