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Proceedings Paper

Effect of pressure differentials on pelliclized photomasks
Author(s): Robert W. Murphy; Rick Boyd
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Paper Abstract

Maintaining the integrity of a pelliclized photomask during air shipments can be very challenging. Changes in air pressure in the cargo area or cabin of an airplane can cause the volume of air under the pellicle membrane to expand or contract. Pellicle membranes can be damaged or even break under too much stress. Some evidence has suggested that particles may develop in the critical area in the pellicle cavity during shipment. Pellicle suppliers have developed several different methods for equalizing pressure differentials between the pellicle cavity and the surrounding environment. This paper surveys and characterizes the different methods used to relieve pressure differentials on pelliclized photomasks. The effect of membrane expansion on membrane quality and defect formation is also studied.

Paper Details

Date Published: 7 December 1994
PDF: 15 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195815
Show Author Affiliations
Robert W. Murphy, Apex Lithography Services (United States)
Rick Boyd, Intel Corp. (Japan)

Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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