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Proceedings Paper

Reticle processes for 256-Mbit DRAM
Author(s): Kazuhiko Sumi; Yutaka Miyahara
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Paper Abstract

In manufacturing 256-Mbit DRAM reticles, it is said that 4x reticles will be required. In this case, we must control 1.0 micrometers patterns on the reticle. Therefore, to achieve this accuracy, we need to solve some problems at various stages in manufacturing including exposure, process, and inspection. We studied the process and tried to solve some problems. As a result of our experiments, some effective methods were found. They are: (1) use of thinner resist; and (2) improvement of etchant and the wet etching method. This has the advantage of only needing minor changes of existing techniques. This paper describes the effects of these techniques and the critical dimension (CD) uniformity of reticles.

Paper Details

Date Published: 7 December 1994
PDF: 12 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195809
Show Author Affiliations
Kazuhiko Sumi, Fujitsu Ltd. (Japan)
Yutaka Miyahara, Fujitsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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