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Proceedings Paper

MEBES 4000 optimization and characterization of MEBES 4500
Author(s): Jim DeWitt; J. Millino; Joe Watson; Robert L. Dean; Frederick Raymond III; D. McClure; Leonard Gasiorek; Frank E. Abboud; Robert J. Naber
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Paper Abstract

Performance of a MEBES tool depends in part on how well it is optimized for a particular user application. This paper examines the efforts made to optimize a MEBES 4000 at Intel to meet performance goals of 350 nm design rules. The areas of particular concern are critical dimension, resolution, and composite positional accuracy. PBS resist processes and cassette- specific corrections (CAZOC) for six cassettes are examined to meet these goals. As part of a SEMATECH development program, a MEBES 4000 system at Etec is being upgraded to a MEBES 4500. The performance of the tool is characterized at each incremental phase of the upgrade. Results show that significant advances have been made in accuracy, system calibration and control, and data path.

Paper Details

Date Published: 7 December 1994
PDF: 13 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195805
Show Author Affiliations
Jim DeWitt, Intel Corp. (United States)
J. Millino, Intel Corp. (United States)
Joe Watson, Intel Corp. (United States)
Robert L. Dean, Etec Systems, Inc. (United States)
Frederick Raymond III, Etec Systems, Inc. (United States)
D. McClure, Etec Systems, Inc. (United States)
Leonard Gasiorek, Etec Systems Inc. (United States)
Frank E. Abboud, Etec Systems, Inc. (United States)
Robert J. Naber, Etec Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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