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Proceedings Paper

Optical-electric thin films produced by low voltage reactive plasma-assisted deposition
Author(s): Xu Liu; Bin Wang; Peifu Gu; Jinfa Tang
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Paper Abstract

Low voltage reactive plasma assisted deposition (RPAD) is used here, to deposit the optical- electric films, such as transparent conductive thin films and Si3N4 films. Comparing to other thermal evaporation techniques, RPAD can produce more easily such kind of opto- electric thin films. Experimental results of the films deposited will be presented in this paper.

Paper Details

Date Published: 4 November 1994
PDF: 6 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192171
Show Author Affiliations
Xu Liu, Zhejiang Univ. (China)
Bin Wang, Zhejiang Univ. (China)
Peifu Gu, Zhejiang Univ. (China)
Jinfa Tang, Zhejiang Univ. (China)

Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings
Florin Abeles, Editor(s)

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