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Proceedings Paper

Single and multilayer coatings deposited by laser-assisted electron beam evaporation
Author(s): Dieter Schaefer; Peter Thomsen-Schmidt; H. Johansen; T. Martini; Bernhard Steiger; G. Pfeifer; Guenter Reisse
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Paper Abstract

Laser assisted electron beam evaporation is a new deposition technique to improve the microstructure of HfO2 and Y2O3 films for optical applications. Major advantages of this method are an increased refractive index, a higher laser damage threshold at 248 nm and reduced absorption compared with films deposited by electron beam evaporation. It is possible to influence the refractive index changing by the laser power and to prepare multilayer like systems containing only one coating material.

Paper Details

Date Published: 4 November 1994
PDF: 8 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192126
Show Author Affiliations
Dieter Schaefer, Berliner Institut fuer Optik GmbH (Germany)
Peter Thomsen-Schmidt, Berliner institut fuer Optik GmbH (Germany)
H. Johansen, Max-Planck-Institut fuer Mikrostrukturphysik (Germany)
T. Martini, Max-Planck-Institut fuer Mikrostrukturphysik (Germany)
Bernhard Steiger, Hochschule fuer Technik und Wirtschaft (Germany)
G. Pfeifer, Hochschule fuer Technik und Wirtschaft (Germany)
Guenter Reisse, Hochschule fuer Technik und Wirtschaft (Germany)

Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings
Florin Abeles, Editor(s)

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