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Proceedings Paper

Influence of preparation conditions on the laser damage threshold of oxide thin films at 248 nm measured by photoacoustic mirage detection
Author(s): Michael Reichling; J. Siegel; Eckart Matthias; Dieter Schaefer; Peter Thomsen-Schmidt
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Paper Abstract

The ablation damage thresholds for electron beam evaporated HfO2/SiO2 single-, double-, and triple-layer systems of (lambda) /4 optical thickness ((lambda) equals 248 nm) are measured by the pulsed photoacoustic mirage technique. It is shown that the apparent threshold depends on the specific system design and results are interpreted in terms of the electric field distribution in the respective configuration. For one system it is demonstrated that the threshold for the onset of damage measured by the mirage technique can be enhanced by a factor of two when the layers are deposited by laser assisted evaporation technique.

Paper Details

Date Published: 4 November 1994
PDF: 7 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192096
Show Author Affiliations
Michael Reichling, Freie Univ. Berlin (Germany)
J. Siegel, Freie Univ. Berlin (Germany)
Eckart Matthias, Freie Univ. Berlin (Germany)
Dieter Schaefer, Berliner Institut fuer Optik GmbH (Germany)
Peter Thomsen-Schmidt, Berliner Institut fuer Optik GmbH (Germany)

Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings
Florin Abeles, Editor(s)

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