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Proceedings Paper

Degradation of thin films in low-earth-orbit and comparisons with laboratory simulation
Author(s): Blaine R. Spady; Ron A. Synowicki; Jeff Hale; M. J. DeVries; Natale Joseph Ianno; William A. McGahan; John A. Woollam
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Paper Abstract

Low earth orbit exposes space materials simultaneously to atomic oxygen and ultraviolet light. Numerous materials were sputtered, e-beam evaporated, and CVD deposited. Experiments with these samples aboard the NASA (USA) 1992 and 1993 space flights STS-46 and STS-51 are discussed, and comparisons made with laboratory studies in an oxygen plasma environment. Multiple samples of thin films of Al, diamondlike carbon, diamond, silicon nitride, silicon carbide, and solar concentrator multilayer stacks were prepared. These were characterized both before and after flight by spectroscopic ellipsometry, spectrophotometry, interferometry, Auger spectroscopy, Raman spectroscopy, and atomic force microscopy.

Paper Details

Date Published: 4 November 1994
PDF: 7 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192089
Show Author Affiliations
Blaine R. Spady, Univ. of Nebraska/Lincoln (United States)
Ron A. Synowicki, Univ. of Nebraska/Lincoln (United States)
Jeff Hale, Univ. of Nebraska/Lincoln (United States)
M. J. DeVries, Univ. of Nebraska/Lincoln (United States)
Natale Joseph Ianno, Univ. of Nebraska/Lincoln (United States)
William A. McGahan, Univ. of Nebraska/Lincoln (United States)
John A. Woollam, Univ. of Nebraska/Lincoln (United States)

Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings
Florin Abeles, Editor(s)

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