Share Email Print

Proceedings Paper

Novel defect inspection method for the LSI mask pattern data
Author(s): Touru Miyauchi; Kenichi Kobayashi; Kazumasa Shigematsu
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

It is difficult to inspect the accuracy of LSI mask pattern data processed with a data processing system and to decide whether logical operations and sizing have been performed correctly. We devised a method to inspect mask pattern data for reticle patterns. We compared two sets of mask pattern data, each set processed with a different algorithm. We monitored the system to check the design rules between the layers or for a single. To implement this method, we developed and combined two devices, PAVE and PATACON, and set up the New Conversion and Inspection System of Mask Pattern Data.

Paper Details

Date Published: 3 November 1994
PDF: 8 pages
Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191955
Show Author Affiliations
Touru Miyauchi, Fujitsu Ltd. (Japan)
Kenichi Kobayashi, Fujitsu Ltd. (Japan)
Kazumasa Shigematsu, Fujitsu Ltd. (Japan)

Published in SPIE Proceedings Vol. 2254:
Photomask and X-Ray Mask Technology
Hideo Yoshihara, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?