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Proceedings Paper

Manufacturing of half-tone phase-shift masks I: blank
Author(s): Hiroshi Mohri; Keiji Hashimoto; T. Tominaga; Yasutaka Morikawa; Junji Fujikawa; Hiroyuki Inomata; Y. Iimura; Wataru Gotoh; Masahiro Takahashi; Hisatake Sano
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Paper Abstract

Half-tone phase shift mask (HT-PSM) blanks for i-line (365 nm) and g-line (436 nm) lithography, using chromium composites as a half-tone shifter, are brought into production. A bilayer structure of a 10 - 20 nm thick opaque, conductive chrome layer and a phase-shifting CrON layer is proposed, which can be formed by continuous deposition of the two layers and etched continuously by the process similar to that of the conventional chrome photomask. It shows low visible light transmission of less than 30% so that it can be inspected, and also shows enough conductivity to decay the excess charge during electron beam writing. HT- PSMs made of these blanks can be cleaned by sulfuric acid at 100 degree(s)C and can be used at least up to an irradiation of 1 MJ/cm2, when used for i-line exposure. The specification for the transmission is (target +/- 1)% for any point on any plate, and 0.7% range for any point on one plate, where the target ranges from 6% to 10%. The specification for the phase shift is currently (180+/- 10) degree(s).

Paper Details

Date Published: 3 November 1994
PDF: 10 pages
Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); doi: 10.1117/12.191935
Show Author Affiliations
Hiroshi Mohri, Dai Nippon Printing Co., Ltd. (Japan)
Keiji Hashimoto, Dai Nippon Printing Co., Ltd. (Japan)
T. Tominaga, Dai Nippon Printing Co., Ltd. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Junji Fujikawa, Dai Nippon Printing Co., Ltd. (Japan)
Hiroyuki Inomata, Dai Nippon Printing Co., Ltd. (Japan)
Y. Iimura, Dai Nippon Printing Co., Ltd. (Japan)
Wataru Gotoh, Dai Nippon Printing Co., Ltd. (Japan)
Masahiro Takahashi, Dai Nippon Printing Co., Ltd. (Japan)
Hisatake Sano, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 2254:
Photomask and X-Ray Mask Technology
Hideo Yoshihara, Editor(s)

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