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Proceedings Paper

Reactive ion etching of microlens arrays into fused silica
Author(s): Stefan Haselbeck; Martin Eisner; Horst Schreiber; Johannes Schwider
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Paper Abstract

Microlens arrays made in photoresist can be transferred into fused silica substrates by reactive ion etching herby, the etch rates of resist and silica differ by a factor of up to 3 depending on the oxygen content of the reacting gases in the etching machine. The resulting lenses are tested for the surface quality with the help of a Mach- Zehnder interference microscope. Merit functions such as point spread function and modulation transfer function can be calculated from the measured wave aberration data.

Paper Details

Date Published: 12 October 1994
PDF: 5 pages
Proc. SPIE 2169, Nonconventional Optical Imaging Elements, (12 October 1994); doi: 10.1117/12.190220
Show Author Affiliations
Stefan Haselbeck, Univ. Erlangen-Nuernberg (Germany)
Martin Eisner, Univ. Erlangen-Nuernberg (Germany)
Horst Schreiber, Univ. Erlangen-Nuernberg (Germany)
Johannes Schwider, Univ. Erlangen-Nuernberg (Germany)

Published in SPIE Proceedings Vol. 2169:
Nonconventional Optical Imaging Elements
Jerzy Nowak; Marek Zajac, Editor(s)

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