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Proceedings Paper

Variable-shaped electron beam lithography application for creation of diffractive optical elements
Author(s): Sergey V. Babin; Victor A. Danilov
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Paper Abstract

Peculiarities of variable shaped EBL application to DOE topology generation are regarded. The estimation of exposure data volume is proposed as a function of DOE parameters and approximation accuracy. A special software was developed to prepare DOE's exposure data. Experimental results on topology fabrication are presented for DOE focusing irradiation into a ring with ordered parameters, as well as artificial index gratings.

Paper Details

Date Published: 12 October 1994
PDF: 10 pages
Proc. SPIE 2169, Nonconventional Optical Imaging Elements, (12 October 1994); doi: 10.1117/12.190216
Show Author Affiliations
Sergey V. Babin, Physics and Technology Institute (Russia)
Victor A. Danilov, Central Unique Design Institute (Russia)

Published in SPIE Proceedings Vol. 2169:
Nonconventional Optical Imaging Elements
Jerzy Nowak; Marek Zajac, Editor(s)

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