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Proceedings Paper

Scatter performance of a plasma-cleaned germanium wafer flown on the Long-Duration Exposure Facility
Author(s): Richard Fedors
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Paper Abstract

A germanium wafer from the Long Duration Exposure Facility Interplanetary Dust Experiment underwent plasma cleaning to evaluate contamination removal effectiveness for molecular layers that had accumulated over the course of the mission. Angle resolved scattering at visible wavelength was utilized to measure the change in optical performance between the as-received and cleaned portions of the test sample. Results showed a significant improvement in the sample's optical quality with reactive ion cleaning, based on laboratory measurements of bi-directional reflectance distribution. Test procedures, instrumentation, and experimental data (including computed total integrated scatter) are described. Besides detecting and removing environmental contamination from sensitive optical surfaces, these techniques could be applied to semiconductor manufacturing to increase product yield, lower production costs, and improve component reliability.

Paper Details

Date Published: 19 October 1994
PDF: 12 pages
Proc. SPIE 2261, Optical System Contamination: Effects, Measurements, and Control IV, (19 October 1994); doi: 10.1117/12.190150
Show Author Affiliations
Richard Fedors, Rome Lab. (United States)

Published in SPIE Proceedings Vol. 2261:
Optical System Contamination: Effects, Measurements, and Control IV
A. Peter M. Glassford, Editor(s)

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