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Proceedings Paper

Fabrication and testing of a silicon immersion grating for infrared spectroscopy
Author(s): Paul J. Kuzmenko; Dino R. Ciarlo; Charles G. Stevens
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Paper Abstract

recent advances in silicon micromachining techniques allow the fabrication of very coarse infrared echelle gratings. When used in immersion mode the dispersion is increased proportionally to the refractive index. This permits a very significant reduction in the overall size of a spectrometer while maintaining the same resolution. We have fabricated a right triangular prism from silicon with a grating etched into the face of the hypotenuse. The grating covers an area of 32 mm by 64 mm and has a 97.5 micrometers periodicity with a blaze angle of 63.4 degree(s). The groove surfaces are very smooth with a roughness of a few nm. Random defects in the silicon are the dominant source of grating scatter. We measure a grating ghost intensity of 1.2%. The diffraction peak is quite narrow, slightly larger than the Airy disc diameter at F/12. However, due to wavefront aberrations, perhaps 15-20% of the diffracted power is in the peak with the rest distributed in a diameter roughly five times the airy disc.

Paper Details

Date Published: 30 September 1994
PDF: 12 pages
Proc. SPIE 2266, Optical Spectroscopic Techniques and Instrumentation for Atmospheric and Space Research, (30 September 1994); doi: 10.1117/12.187593
Show Author Affiliations
Paul J. Kuzmenko, Lawrence Livermore National Lab. (United States)
Dino R. Ciarlo, Lawrence Livermore National Lab. (United States)
Charles G. Stevens, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 2266:
Optical Spectroscopic Techniques and Instrumentation for Atmospheric and Space Research
Jinxue Wang; Paul B. Hays, Editor(s)

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