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Proceedings Paper

Pareto charts for defect analysis with correlation of inline defects to failed bitmap data
Author(s): Louis Breaux; Dave Kolar; Robyn Sue Coleman
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Paper Abstract

Pareto analysis has become one of the most important and widely used tools in solving quality problems. The usefulness of Pareto analysis extends well beyond the application to defect data being applicable to most every department in a company including marketing, production planning, purchasing, sales, maintenance, personnel, accounting, etc. A proper implementation of this tool requires an understanding of the techniques that have been developed and knowing its limitations. In the microelectronics industry processing and analysis of defect data relies heavily on Pareto analysis. With inline defect scanning tools becoming faster and more sensitive, a program to monitor inline defectivity on a regular basis is justified. Correlation of this data with end-of-line electrical failure analysis provides the most accurate Pareto of the most important "killer" defect types.

Paper Details

Date Published: 1 July 1994
PDF: 27 pages
Proc. SPIE 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review, 102740I (1 July 1994); doi: 10.1117/12.187459
Show Author Affiliations
Louis Breaux, Motorola (United States)
Dave Kolar, Motorola (United States)
Robyn Sue Coleman, KLA Instruments Corp. (United States)

Published in SPIE Proceedings Vol. 10274:
Handbook of Critical Dimension Metrology and Process Control: A Critical Review
Kevin M. Monahan, Editor(s)

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