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Proceedings Paper

New approach to measuring oxide charge and mobile ion concentration
Author(s): Piotr Edelman; Andrew M. Hoff; Lubek Jastrzebski; Jacek J. Lagowski
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Paper Abstract

We discuss the determination of oxide charge from simultaneous noncontact measurement of the surface potential barrier, Vs, (via surface photovoltage) and the voltage drop across the oxide, Vox, (via contact potential vibrating probe). These two measurements enable us to separate the contributions from total charge and oxide charge. In combination with corona charging and low temperature stress, this approach can be used for wafer-scale determination of the mobile Na+ concentration. The principles of the approach are presented and typical results are given which contrast the effects of ion drift and charge injection in the oxide. Experimental results also illustrate the noncontact, wafer-scale mapping of the mobile ion distribution.

Paper Details

Date Published: 14 September 1994
PDF: 11 pages
Proc. SPIE 2337, Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing, (14 September 1994); doi: 10.1117/12.186641
Show Author Affiliations
Piotr Edelman, Semiconductor Diagnostics, Inc. (United States)
Andrew M. Hoff, Univ. of South Florida (United States)
Lubek Jastrzebski, Univ. of South Florida (United States)
Jacek J. Lagowski, Univ. of South Florida (United States)

Published in SPIE Proceedings Vol. 2337:
Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing
Jagdish P. Mathur; John K. Lowell; Ray T. Chen, Editor(s)

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