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Proceedings Paper

Scanning tunneling microscope-based nanolithography for electronic device fabrication
Author(s): Joseph W. Lyding; Roger T. Brockenbrough; Patrick J. Fay; John R. Tucker; Karl Hess
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Paper Details

Date Published: 3 October 1993
PDF: 16 pages
Proc. SPIE 10310, Technology of Proximal Probe Lithography, 1031008 (3 October 1993); doi: 10.1117/12.183199
Show Author Affiliations
Joseph W. Lyding, Univ. of Illinois, Urbana-Champaign (United States)
Roger T. Brockenbrough, Univ. of Illinois, Urbana-Champaign (United States)
Patrick J. Fay, Univ. of Illinois, Urbana-Champaign (United States)
John R. Tucker, Univ. of Illinois, Urbana-Champaign (United States)
Karl Hess, Univ. of Illinois, Urbana-Champaign (United States)


Published in SPIE Proceedings Vol. 10310:
Technology of Proximal Probe Lithography
Christie R. K. Marrian, Editor(s)

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