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Proceedings Paper

New technologies of integrated optics elements fabrication: monolith integrated-optical device
Author(s): Alexander M. Kamuz; Pavel F. Oleksenko; Y. U. Ovsyannikov; S. D. Kiyashko; Oksana N. Stril'chuk
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Paper Abstract

The new technology for making the elements and devices of semiconductor integrated optics is presented. We report about creation in the planar diffusion CdSSe-waveguides such integrated optical elements as the channel waveguides, diffractive gratings for input or output of the emission, local waveguide photoresistors and monolith integrated optical device. This technology is based on the phenomenon of the light induced irreversible change (decreasing) of the subsurface layer refractive index of the single crystal that is immersed in high polar liquid at the room temperature under band-to-band absorbed illumination. At the first time this phenomenon was detected by us in CdS-single crystals and called low temperature photohydromodification.

Paper Details

Date Published: 28 July 1994
PDF: 9 pages
Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); doi: 10.1117/12.180972
Show Author Affiliations
Alexander M. Kamuz, Institute of Physics of Semiconductors (Ukraine)
Pavel F. Oleksenko, Institute of Physics of Semiconductors (Ukraine)
Y. U. Ovsyannikov, Institute of Physics of Semiconductors (Ukraine)
S. D. Kiyashko, Institute of Physics of Semiconductors (Ukraine)
Oksana N. Stril'chuk, Institute of Physics of Semiconductors (Ukraine)

Published in SPIE Proceedings Vol. 2213:
Nanofabrication Technologies and Device Integration
Wolfgang Karthe, Editor(s)

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