A grating fabrication technology has been established for producing DFB- /DBR-grating structures in Er-doped Ti:LiNbO₃ waveguide lasers. It is based on holographically defined resist gratings transferred into the surface of LiNbO₃ waveguides using reactive ion etching with SF₆ gas as the dry etching technique. For a sample with a 24 mm long surface relief grating of 346 nm period, a transmission drop of -11.7 dB, a filter bandwidth as small as 0.08 nm, a Bragg resonance wavelength at 1528.4 nm very close to the Erbium absorption line at 1531 nm and excess losses attributed to the grating of only 1 to 2 dB were measured.

Date Published: 28 July 1994
PDF: 10 pages
Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); doi: 10.1117/12.180951

Published in SPIE Proceedings Vol. 2213:
Nanofabrication Technologies and Device Integration
Wolfgang Karthe, Editor(s)