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Proceedings Paper

Contamination of surfaces prior to optical coating by in-situ total internal reflection microscopy
Author(s): David W. Reicher; Kenneth C. Jungling; Charles K. Carniglia
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Paper Abstract

Scatter in thin film optical coatings may arise from a variety of sources. Our previous investigations have used total internal reflection microscopy (TIRM) to monitor scatter site generation during film growth. These studies have reported the effects of substrate cleaning techniques and certain deposition parameters on scatter site generation. The present investigation using TIRM to monitor the coating process has yielded new insight into defect generating mechanisms for films of HfO2 and ZrO2. Of particular interest is surface contamination apparently caused by electrostatic effects. Introduction of high electric potentials in the vacuum chamber has been observed to cause surface contamination prior to deposition, resulting in a significant increase in the number of scatter sites.

Paper Details

Date Published: 28 July 1994
PDF: 12 pages
Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); doi: 10.1117/12.180908
Show Author Affiliations
David W. Reicher, Univ. of New Mexico (United States)
Kenneth C. Jungling, Univ. of New Mexico (United States)
Charles K. Carniglia, S. Systems Corp. (United States)

Published in SPIE Proceedings Vol. 2114:
Laser-Induced Damage in Optical Materials: 1993
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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