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Proceedings Paper

Holographic lithography for microcircuits
Author(s): Ray T. Chen; Lev S. Sadovnik; Tin M. Aye; Tomasz P. Jannson
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Paper Abstract

Experimental results of a high resolution holographic imaging system using lensless geometry are demonstrated. A master mask is imaged on a photopolymer and is recorded as a volume hologram, which is then employed as the hologrphic mask. Formation of a 0.5un resolution image was consistently observed in a large field with illumination by an Argon laser operating at 457 nm, and the pattern was successfully recorded on photoresist.

Paper Details

Date Published: 1 May 1990
PDF: 7 pages
Proc. SPIE 1212, Practical Holography IV, (1 May 1990); doi: 10.1117/12.17991
Show Author Affiliations
Ray T. Chen, Physical Optics Corp. (United States)
Lev S. Sadovnik, Physical Optics Corp. (United States)
Tin M. Aye, Physical Optics Corp. (United States)
Tomasz P. Jannson, Physical Optics Corp. (United States)

Published in SPIE Proceedings Vol. 1212:
Practical Holography IV
Stephen A. Benton, Editor(s)

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