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Proceedings Paper

IMPA:Ct--in-situ monitors of the particulate ambient: circumterrestrial--an international consortium of instrument suppliers
Author(s): Charles G. Simon; Robert A. Skrivanek; R. Muenzenmayer; A. J. Tuzzolino; W. G. Tanner Jr.; Carl R. Maag; O. Manuel Uy; Jim J. Wortman
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Paper Abstract

The Industry and University participants listed above have joined together to form the IMPA:Ct consortium, which offers a broad range of flight qualified technologies for real time monitoring of small particles, 0.1 micron to 10 cm, in the space environment. Instruments are available in 12 months or less at costs ranging from 0.5 to 1.5 million dollars (US) for the total program. Detector technologies represented by these groups are: impact-induced capacitor-discharge (MOS, metal-oxide-silicon), cratering or penetration of electroactive thin film (polyvinylidene fluoride), impact-plasma detection, acoustic detection, ccd tracking of optical scatter of sunlight, and photodiode detection of optical scatter of laser light. The operational characteristics, general spacecraft interface and resource requirements (mass/power/telemetry), cost and delivery schedules, and points of contact for 7 different instruments are presented.

Paper Details

Date Published: 8 June 1994
PDF: 17 pages
Proc. SPIE 2214, Space Instrumentation and Dual-Use Technologies, (8 June 1994); doi: 10.1117/12.177651
Show Author Affiliations
Charles G. Simon, Institute for Space Science and Technology (United States)
Robert A. Skrivanek, Visidyne, Inc. (United States)
R. Muenzenmayer, Technische Univ. Muenchen (Germany)
A. J. Tuzzolino, Univ. of Chicago (United States)
W. G. Tanner Jr., Baylor Univ. Space Science Lab. (United States)
Carl R. Maag, T & M Engineering, Inc. (United States)
O. Manuel Uy, Johns Hopkins Univ. (United States)
Jim J. Wortman, North Carolina State Univ. (United States)


Published in SPIE Proceedings Vol. 2214:
Space Instrumentation and Dual-Use Technologies
Firooz A. Allahdadi; Michael Chrisp; Concetto R. Giuliano; W. Pete Latham; James F. Shanley, Editor(s)

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