Share Email Print

Proceedings Paper

Interferometric investigation of x-ray mask fabrication distortions
Author(s): Matthew E. Hansen; Roxann L. Engelstad; Michael T. Reilly; Frederick T. Moore
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The investigation of x-ray mask fabrication distortions was initiated in an effort to identify the fabrication parameters responsible for the final x-ray mask shape and configuration. The investigation has identified the sources of fabrication-induced distortion in x-ray mask blank manufacture. The extraction of distortions at each process step allows for mask flatness control via distortion compensation as the mask fabrication process evolves. Interferometric characterization of the final mask blank configuration guarantees the mask flatness. Mask blanks with alignment windows are mapped to determine the locations of the alignment windows relative to the membrane. An additional interferometric wedge test is performed to determine the membrane tilt magnitude and orientation relative to the backside of the mask ring. With proper selection of mask blank materials and control of membrane material deposition and bonding parameters, x-ray masks up to 100 mm in diameter have been fabricated routinely with less than 5 micrometers of bow. Fine-tuning of the x-ray mask configuration may be controlled by variations in the anodic bonding process parameters. Optimization of the anodic bonding process is currently in progress.

Paper Details

Date Published: 13 May 1994
PDF: 6 pages
Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); doi: 10.1117/12.175830
Show Author Affiliations
Matthew E. Hansen, Univ. of Wisconsin/Madison (United States)
Roxann L. Engelstad, Univ. of Wisconsin/Madison (United States)
Michael T. Reilly, Univ. of Wisconsin/Madison (United States)
Frederick T. Moore, Univ. of Wisconsin/Madison (United States)

Published in SPIE Proceedings Vol. 2194:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
David O. Patterson, Editor(s)

© SPIE. Terms of Use
Back to Top