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Proceedings Paper

Effect of condenser mirror surface roughness on partially coherent image formation in proximity x-ray lithography
Author(s): Jiabei Xiao; Franco Cerrina
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Paper Abstract

In synchrotron radiation (SR) proximity x-ray lithography (XRL), the image is formed under a partially coherent illumination condition. Typically the illumination system consists of one or more condenser mirrors that collect the radiation from a synchrotron source and provide a uniform illumination of the x-ray mask. For a non-ideal mirror surface, height irregularity might not be negligible compared to the wavelength of x ray. Although scattering from rough surfaces has been studied extensively, little attention has been given to the effect of partial coherent illumination. For proximity XRL, the angular blur of illumination as large as 2 - 4 mrad (3 (sigma) ) has been proposed on the basis of modeling. The blur from the SR source alone is typically less than 1 mrad (3 (sigma) ). In partially coherent illumination, we found that the roughness can add an extra amount of blur which is desirable. Roughness tolerance for XRL beamline mirrors is determined from this study. Finally, the influence of scattering on lithography image formation is discussed.

Paper Details

Date Published: 13 May 1994
PDF: 11 pages
Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); doi: 10.1117/12.175804
Show Author Affiliations
Jiabei Xiao, Univ. of Wisconsin/Madison (United States)
Franco Cerrina, Univ. of Wisconsin/Madison (United States)

Published in SPIE Proceedings Vol. 2194:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
David O. Patterson, Editor(s)

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