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Proceedings Paper

Deep-UV photolithography cluster performance
Author(s): Noreen Harned
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Paper Abstract

As minimum feature size has decreased, and design rules have tightened, successful deep UV 0.35 micron technology has required a photolithography cluster. Linkage of the lithography exposure tool with the critical apply and develop process is driven by the need to improve cycle time, minimize defects, and optimize image tolerances. This paper summarizes results from Micrascan II photo clusters, and discusses the directions in which photo clusters must continue to evolve in order to satisfy the needs for 0.35 micron, and succeeding generations, of imaging technology.

Paper Details

Date Published: 17 May 1994
PDF: 10 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175487
Show Author Affiliations
Noreen Harned, SVG Lithography Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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