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Proceedings Paper

Manufacturing engineering use of data management to analyze and control stepper performance in existing fabs and on stepper evaluations for new tools
Author(s): Paul W. Ackmann; Stuart E. Brown; Richard D. Edwards; Staci Oshelski
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Paper Abstract

This paper describes the program used to improve data collection and analysis methods in a sub-micron manufacturing environment to control photolithography steppers. The program provides any user a standard method for analysis. The benefits of this methodology are a reduction in analysis time, uniform analysis by use of similar algorithms, and the reduction in the use of multiple database programs. The program's outputs include customized reports, focus exposure curves, data tables, and SPC charts. By storing all information, historical data can be accessible in these output forms. This paper briefly explains the medium used to transfer the data from the stepper and metrology systems. Explanation of the use and results of the on-line data analysis program and examples of the program's output are also given. The program was developed to support manufacturing from 0.8 micrometers to 0.35 micrometers i-line production. The authors feel the programs are flexible enough to add more outputs for different technologies.

Paper Details

Date Published: 17 May 1994
PDF: 11 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175471
Show Author Affiliations
Paul W. Ackmann, Advanced Micro Devices, Inc. (United States)
Stuart E. Brown, Advanced Micro Devices, Inc. (United States)
Richard D. Edwards, Advanced Micro Devices, Inc. (United States)
Staci Oshelski, Advanced Micro Devices, Inc. (United States)

Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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