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Proceedings Paper

Reticle specific compensations to meet production overlay requirements for 64 MB and beyond
Author(s): Richard Rogoff; Syi-Sying Hong; Doug Schramm; Gregg D. Espin
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Paper Abstract

A novel technology has been developed whereby a database of reticle specific compensation can be utilized to correct for magnification, rotation, and translational reticle manufacturing errors. Whenever a given reticle is loaded into the stepper, a reticle barcode defining that specific reticle is read. This barcode is associated with a set of reticle specific compensations that are automatically applied during the execution of a production batch. Reticle compensations can be either empirically determined or taken from reticle manufacturing information. Algorithms have been developed which determine reticle specific compensations based on either the manufacturing data or empirically determined data. This data is easily entered into a database allowing any stepper to access reticle compensation information for any reticle. This paper discusses the procedures involved in determining and implementing reticle specific compensations and presents production overlay data indicating overlay performance with and without reticle compensations.

Paper Details

Date Published: 17 May 1994
PDF: 10 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175468
Show Author Affiliations
Richard Rogoff, ASM Lithography, Inc. (United States)
Syi-Sying Hong, United Microelectronics Corp. (Taiwan)
Doug Schramm, Micron Semiconductor (United States)
Gregg D. Espin, Prometrix (United States)

Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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