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Proceedings Paper

Scattered light in photolithographic lenses
Author(s): Joseph P. Kirk
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Paper Abstract

Scattered light, flare, is present in the images formed by all photolithography lenses and it reduces lithographic process tolerances. It varies from lens to lens and with time, but is easily measured by observation of images of opaque objects formed in positive photoresist. The scattered light halo of a lens is modeled and the model used to estimate the flare for any reticle used with that lens.

Paper Details

Date Published: 17 May 1994
PDF: 7 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175451
Show Author Affiliations
Joseph P. Kirk, IBM Microelectronics (United States)

Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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