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Proceedings Paper

Quantitative stepper metrology using the focus monitor test mask
Author(s): Timothy A. Brunner; Alexander Lee Martin; Ronald M. Martino; Christopher P. Ausschnitt; Thomas H. Newman; Michael S. Hibbs
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Paper Abstract

A new lithographic test pattern, the focus monitor, is introduced. Through the use of phase shift techniques, focus errors translate into easily measurable overlay shifts in the printed pattern. Each individual focus monitor pattern can be directly read for the sign and magnitude of the focus error. This paper presents a detailed verification of the validity of this approach, along with several preliminary applications.

Paper Details

Date Published: 17 May 1994
PDF: 9 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175449
Show Author Affiliations
Timothy A. Brunner, IBM Microelectronics (United States)
Alexander Lee Martin, IBM Microelectronics (United States)
Ronald M. Martino, IBM Microelectronics (United States)
Christopher P. Ausschnitt, IBM Microelectronics (United States)
Thomas H. Newman, Ultratech Stepper, Inc. (United States)
Michael S. Hibbs, IBM Essex Junction (United States)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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