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Proceedings Paper

Experimental study of phase-shifting mask defect detection using phase-shifting interferometry
Author(s): Yiping Xu; Donald K. Cohen; John M. O'Connor; Kuo-Ching Liu; Martin G. Cohen
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Paper Abstract

A new approach is proposed that uses optical phase shifting interferometry to detect phase shifting mask (PSM) defects. The surface topography is measured directly by determining the phase information from the wavefront reflected or transmitted from the surface of the PSM. The defect size, shape, and location can then be easily determined from the measured 3D surface topography, which provides the necessary information for subsequent defect analysis, repair, or removal. A WYKO high resolution surface profiler that utilizes optical phase shifting interferometry was used to carry out extensive experimental studies on different types of programmed defects. Results show that an optical non-contact surface profiler can be very useful in PSM defect detection. A defect as small as 0.25 micrometers can be easily detected.

Paper Details

Date Published: 17 May 1994
PDF: 8 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175418
Show Author Affiliations
Yiping Xu, WYKO Corp. (United States)
Donald K. Cohen, WYKO Corp. (United States)
John M. O'Connor, Quantronix Corp. (United States)
Kuo-Ching Liu, Quantronix Corp. (United States)
Martin G. Cohen, Quantronix Corp. (United States)

Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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