Proceedings Paper
Zone-by-zone optimization of the dummy diffraction mask with auxiliary phase gratings| Format | Member Price | Non-Member Price |
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| $17.00 | $21.00 |
Paper Abstract
Some solutions are suggested for problems in the application of the dummy diffraction mask with the L/S phases grating. The degradation of the isolated pattern resolution can be successfully improved by the sub-resolution type design and the orientation dependency is attended by the zone by zone optimization technique with reduced gap size (approximately 200 micrometers ) between the main and dummy layers.
Paper Details
Date Published: 17 May 1994
PDF: 10 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175415
Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)
PDF: 10 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175415
Show Author Affiliations
Yong-Ho Oh, Electronics and Telecommunications Research Institute (South Korea)
Byung-Sun Park, Electronics and Telecommunications Research Institute (South Korea)
Hai Bin Chung, Electronics and Telecommunications Research Institute (South Korea)
Sang-Soo Choi, Electronics and Telecommunications Research Institute (South Korea)
Byung-Sun Park, Electronics and Telecommunications Research Institute (South Korea)
Hai Bin Chung, Electronics and Telecommunications Research Institute (South Korea)
Sang-Soo Choi, Electronics and Telecommunications Research Institute (South Korea)
Seong-Hak Choi, Electronics and Telecommunications Research Institute (South Korea)
Hyung Joun Yoo, Electronics and Telecommunications Research Institute (South Korea)
Sin-Chong Park, Electronics and Telecommunications Research Institute (South Korea)
Hyung Joun Yoo, Electronics and Telecommunications Research Institute (South Korea)
Sin-Chong Park, Electronics and Telecommunications Research Institute (South Korea)
Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)
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