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Proceedings Paper

Attenuating phase-shift mask by thermal oxidation of chrome
Author(s): David S. O'Grady; Phil B. Wilber
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Paper Abstract

A novel approach to fabricating an embedded attenuating DUV phase-shift mask by thermally oxidizing chrome is examined. Sputtered films of various chrome oxide composition have been proposed for i-line phase-shift masks, but the films to data have lacked a high enough transmission at the DUV wavelength. Thermally oxidized chrome is shown to produce a transmission usable at the DUV wavelength. The effects of oxidation time and temperature are examined, along with transmission and phase-shift as a function of chrome oxide thickness. While the thermal oxidation of chrome is not fully workable to fabricate a complete mask, it demonstrates the feasibility of using chrome-based materials in fabricating a DUV-embedded attenuating phase-shift mask.

Paper Details

Date Published: 17 May 1994
PDF: 7 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175413
Show Author Affiliations
David S. O'Grady, IBM Essex Junction (United States)
Phil B. Wilber, IBM Essex Junction (United States)

Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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