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Proceedings Paper

Evaluation results for the positive deep UV resist AZ DX 46
Author(s): Walter Spiess; Thomas J. Lynch; Charles Le Cornec; Gary C. Escher; Yoshiaki Kinoshita; John Kochan; Takanori Kudo; Seiya Masuda; Thierry Mourier; Yuko Nozaki; Setha G. Olson; Hiroshi Okazaki; Munirathna Padmanaban; Georg Pawlowski; Klaus Juergen Przybilla; Horst Roeschert; Natusmi Suehiro; Francoise Vinet; Horst Wengenroth
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Paper Abstract

This contribution emphasizes resist application site by communicating lithographic results for AZ DX 46, obtained using the GCA XLS 7800/31 stepper, NA equals 0.53, equipped with krypton fluoride excimer laser ((lambda) equals 248 nm), model 4500 D, as exposure source, delivered by Cymer Laser Technologies. As far as delay time experiments are concerned ASM-L PAS 5500/70 stepper, NA equals 0.42, was used in combination with Lambda Physik excimer laser, model 248 L.

Paper Details

Date Published: 16 May 1994
PDF: 12 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175402
Show Author Affiliations
Walter Spiess, Hoechst AG (Germany)
Thomas J. Lynch, Hoechst Celanese Corp. (United States)
Charles Le Cornec, LETI/CEN/G (France)
Gary C. Escher, SEMATECH (United States)
Yoshiaki Kinoshita, Hoechst Japan Ltd. (Japan)
John Kochan, Steag Industries, Inc. (United States)
Takanori Kudo, Hoechst Japan Ltd. (Japan)
Seiya Masuda, Hoechst Japan Ltd. (Japan)
Thierry Mourier, LETI/CEN/G (France)
Yuko Nozaki, Hoechst Japan Ltd. (Japan)
Setha G. Olson, Hoechst AG (United States)
Hiroshi Okazaki, Hoechst Japan Ltd. (Japan)
Munirathna Padmanaban, Hoechst Japan Ltd. (Japan)
Georg Pawlowski, Hoechst AG Central Research . (United States)
Klaus Juergen Przybilla, Hoechst Japan Ltd. (Japan)
Horst Roeschert, Hoechst AG (Germany)
Natusmi Suehiro, Hoechst Japan Ltd. (Japan)
Francoise Vinet, LETI/CEN/G (France)
Horst Wengenroth, Hoechst AG (Germany)

Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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