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Proceedings Paper

Diffusion enhanced silylation resist (DESIM): a simulator for the DESIRE process
Author(s): Bhvanesh P. Mathur; Khalil I. Arshak; Arousian Arshak; Declan McDonagh
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Paper Abstract

DESIM is an exclusive simulator for the DESIRE process. It can model all the three unit processes i.e. surface imaging (projection/contact, conventional/phase-shifted mask), silylation (positive/negative tone, gas/liquid phase, pre-silylation baking), dry development (single and two step). This paper discusses some of the models and then evaluates the performance of the simulator by comparing the simulated results.

Paper Details

Date Published: 16 May 1994
PDF: 9 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175364
Show Author Affiliations
Bhvanesh P. Mathur, Univ. of Limerick (Ireland)
Khalil I. Arshak, Univ. of Limerick (Ireland)
Arousian Arshak, Univ. of Limerick (Ireland)
Declan McDonagh, Univ. of Limerick (Ireland)

Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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