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Proceedings Paper

Steady state particle motion in a single wafer reactor
Author(s): Daniel D. White Jr.
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Paper Abstract

The steady state motion of a particle in a single wafer reactor is investigated by mathematical simulation. The goal is to determine the effects of the operating conditions on particle contamination. The flow simulations show that particle contamination during steady state processing (nonplasma) is small in single-wafer reactors running at moderate conditions. Steady state contamination of the wafers occurs when the particle momentum is large, due either to large particles or high velocities which can be from either high flow rates or low pressures. However, for low velocities and large residence times, gravity will cause particles to settle out of the flow. For this case, face-down processing has a large advantage over face- up. Thermophoretic forces are very important at low velocities. Hot surfaces remain clean, whereas cold surfaces become contaminated. Since steady state contamination is not very likely for small particles, contamination may arise from large particles that break up on impact or from nonsteady operation when the gases are turned on and off.

Paper Details

Date Published: 1 May 1994
PDF: 12 pages
Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); doi: 10.1117/12.174142
Show Author Affiliations
Daniel D. White Jr., Texas Instruments Inc. (United States)

Published in SPIE Proceedings Vol. 2196:
Integrated Circuit Metrology, Inspection, and Process Control VIII
Marylyn Hoy Bennett, Editor(s)

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