Share Email Print

Proceedings Paper

Novel algorithm for comparative measurement of submicrometre features on photomasks
Author(s): John W. Nunn; P. Salmon
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

A new method for the measurement of linewidths on integrated circuit photomasks using an optical microscope is described allowing the accurate measurement of features which are not fully resolved, even when the instrument is not perfectly focused and there is considerable spherical aberration in the optical imaging system. This paper demonstrates how an optical microscope which produces scaled image intensity profiles can be calibrated to exploit a new measurement algorithm.

Paper Details

Date Published: 1 February 1993
PDF: 10 pages
Proc. SPIE 2088, Laser Dimensional Metrology: Recent Advances for Industrial Application, (1 February 1993); doi: 10.1117/12.168065
Show Author Affiliations
John W. Nunn, National Physical Lab. (United Kingdom)
P. Salmon, King's College London (United Kingdom)

Published in SPIE Proceedings Vol. 2088:
Laser Dimensional Metrology: Recent Advances for Industrial Application
Michael J. Downs, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?