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Proceedings Paper

Ealing Schwarzschild microscope using 50 to 60 nm illumination from a laser plasma EUV source
Author(s): Lan Sun; Gary A. Sweezey; William T. Silfvast
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Paper Abstract

The construction of an extreme ultraviolet reflection imaging microscope at CREOL using an Ealing Schwarzschild objective and a laser-produced plasma source is summarized. Proposed operation of the present system in the 50 - 60 nm wavelength region is discussed.

Paper Details

Date Published: 1 February 1994
PDF: 10 pages
Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994); doi: 10.1117/12.168013
Show Author Affiliations
Lan Sun, CREOL/Univ. of Central Florida (United States)
Gary A. Sweezey, CREOL/Univ. of Central Florida (United States)
William T. Silfvast, CREOL/Univ. of Central Florida (United States)

Published in SPIE Proceedings Vol. 2015:
Applications of Laser Plasma Radiation
Martin C. Richardson, Editor(s)

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