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Proceedings Paper

Fundamental process during pulsed-laser deposition of thin films
Author(s): Rajiv K. Singh
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Paper Abstract

A model to estimate plasma absorption during deposition of thin films has been developed. In this model, the time-dependent plasma dimension is replaced by the time dependent ablation depth which can be determined by numerical simulations. A model to predict the spatial in- homogeneities in the laser-deposited films has also been developed.

Paper Details

Date Published: 1 February 1994
PDF: 18 pages
Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); doi: 10.1117/12.167549
Show Author Affiliations
Rajiv K. Singh, Univ. of Florida (United States)

Published in SPIE Proceedings Vol. 2045:
Laser-Assisted Fabrication of Thin Films and Microstructures
Ian W. Boyd, Editor(s)

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