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Proceedings Paper

Laser-beam writing for integrated-optic devices in Ti:LiNbO3
Author(s): Masamitsu Haruna; Hiroshi Nishihara
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Paper Abstract

This paper presents the recent topics of the laser-beam (LB) writing techniques for fabrication of integrated-optic devices in Ti:LiNbO3 in addition to the practical LB writing system for channel waveguide patterning in photoresist. Recently, the direct LB writing of TiO2 channels on LiNbO3 was demonstrated, providing the photoresist-free process for fabrication of Ti:LiNbO3 waveguides with higher accuracy and reproducibility. Besides the channel waveguide patterning, the interdigital electrodes required for TE-TM mode conversion in Ti:LiNbO3 waveguide wavelength filters can be defined with an accuracy of the order of nanometer by a unique LB writing technique that is the so-called LB periodic-dot writing. The writing accuracy is discussed in detail as well as the performance of the fabricated filter.

Paper Details

Date Published: 1 February 1994
PDF: 11 pages
Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); doi: 10.1117/12.167547
Show Author Affiliations
Masamitsu Haruna, Osaka Univ. (Japan)
Hiroshi Nishihara, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 2045:
Laser-Assisted Fabrication of Thin Films and Microstructures
Ian W. Boyd, Editor(s)

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