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Proceedings Paper

Continuous-wave laser-assisted fabrication of microstructures in silicon microelectronics
Author(s): Geoffroy Auvert
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Paper Abstract

The laser microchemical direct-write process is a powerful method to fabricate microstructures required for drawing interconnection networks in customized circuits and remodelling prototype circuits. The laser microchemical direct-write technique is presented by reviewing some laser-induced chemical reactions involved in the deposition of materials used in the microelectronics field. Investigation of the deposition of metals and silicon micrometer-size lines or dots using a cw argon-ion laser operating at wavelengths around 0.5 micrometers , is described. The growth kinetics, morphology and electrical resistivity of the deposits are studied in detail at various scanning speeds of the laser spot, laser beam powers and reactant gas pressures. Investigations of the kinetics of the chemical reactions allow us to propose reaction mechanisms for the decomposition of the reactive molecules used. On the basis of reported results, the use of the laser direct-write process as a tool for restructuring integrated circuits is presented.

Paper Details

Date Published: 1 February 1994
PDF: 12 pages
Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); doi: 10.1117/12.167544
Show Author Affiliations
Geoffroy Auvert, France Telecom (France)

Published in SPIE Proceedings Vol. 2045:
Laser-Assisted Fabrication of Thin Films and Microstructures
Ian W. Boyd, Editor(s)

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