
Proceedings Paper
Optical emission spectroscopy on the GEC reference cellFormat | Member Price | Non-Member Price |
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Paper Abstract
Spatially resolved optical imaging experiments were conducted on an Ar plasma in a parallel plate reactor known as the Gaseous Electronics Conference RF Reference Cell. The experiment consisted of recording the optical emission discharges at pressures of 0.1 to 1.0 torr at 75 to 200 Vp-p for 1024 points across the electrode and at heights of 2.0, 6.0, 10.0, 14.0, 18.0, and 22 mm above the bottom powered electrode. Two argon neutral lines at 750.4 and 696 nm and two Ar ion lines at 427.8 and 488 nm were studied. The Ar plasma was found to be non uniform. The extent of the non uniformity varied, and in general was in the shape of annular rings with large intensities around the edges of the electrodes.
Paper Details
Date Published: 15 February 1994
PDF: 7 pages
Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); doi: 10.1117/12.167341
Published in SPIE Proceedings Vol. 2091:
Microelectronic Processes, Sensors, and Controls
Kiefer Elliott; James A. Bondur; James A. Bondur; Kiefer Elliott; John R. Hauser; John R. Hauser; Dim-Lee Kwong; Asit K. Ray, Editor(s)
PDF: 7 pages
Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); doi: 10.1117/12.167341
Show Author Affiliations
Melisa J. Buie, Univ. of Michigan (United States)
Jeremiah T.P. Pender, Univ. of Michigan (United States)
T. Vincent, Univ. of Michigan (United States)
Jeremiah T.P. Pender, Univ. of Michigan (United States)
T. Vincent, Univ. of Michigan (United States)
J. Holloway, Univ. of Michigan (United States)
Mary L. Brake, Univ. of Michigan (United States)
Michael E. Elta, Univ. of Michigan (United States)
Mary L. Brake, Univ. of Michigan (United States)
Michael E. Elta, Univ. of Michigan (United States)
Published in SPIE Proceedings Vol. 2091:
Microelectronic Processes, Sensors, and Controls
Kiefer Elliott; James A. Bondur; James A. Bondur; Kiefer Elliott; John R. Hauser; John R. Hauser; Dim-Lee Kwong; Asit K. Ray, Editor(s)
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