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Proceedings Paper

Phase-shifting mask fabrication
Author(s): Christophe Pierrat; John DeMarco
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Paper Abstract

The choice of a fabrication technique for phase-shifting masks is described by comparing approaches in which the shifter patterns are defined by etching the substrate (subtractive approach) or by adding a layer to the substrate (additive approach). By reviewing the various fabrication alternatives, a subtractive methodology that allows the fabrication of any type of phase-shift pattern (alternating aperture, assist-slot, rime, chromeless) on the same mask with only three lithographic steps was adopted. This process was extended to the fabrication of attenuated phase-shifting masks. The current processing capabilities are reviewed.

Paper Details

Date Published: 15 February 1994
PDF: 10 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167278
Show Author Affiliations
Christophe Pierrat, AT&T Bell Labs. (United States)
John DeMarco, AT&T Bell Labs. (United States)

Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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