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Proceedings Paper

Universal pattern data format
Author(s): Michael R. Rolle
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Paper Abstract

This paper will discuss a new universal format for representing the pattern data and other information which define integrated circuits and the process of making them. The format, and the applications to be built around it, are designed to greatly save in cost, reduce production time, eliminate errors, and simplify procedures. It is called a `universal' format because the pattern data for a mask or a wafer can be encoded independently of the method of manufacturing it, and all tools can access the same data file without data conversion. The format encompasses all aspects of production, including mask layout, critical dimensions, e- beam and optical stepper proximity corrections, phase shift masks, and overlap removal. This paper discusses technology for connecting the universal format data in real time to high-speed tools for lithography (both raster and shaped beam technologies) and inspection.

Paper Details

Date Published: 15 February 1994
PDF: 12 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167270
Show Author Affiliations
Michael R. Rolle, Pattern Data Systems (United States)

Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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