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Proceedings Paper

Automatic defects classification for photolithographics reticles
Author(s): Denis M. Rigaill; Henry Roussel-Dupre; Michel Tissier; Yann Guerin
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Paper Abstract

Abstract not available.

Paper Details

Date Published: 15 February 1994
PDF: 12 pages
Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); doi: 10.1117/12.167264
Show Author Affiliations
Denis M. Rigaill, IBM France (France)
Henry Roussel-Dupre, IBM France (France)
Michel Tissier, IBM France (France)
Yann Guerin, IBM France (France)

Published in SPIE Proceedings Vol. 2087:
13th Annual BACUS Symposium on Photomask Technology and Management
Edward C. Grady; Jack P. Moneta, Editor(s)

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