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Proceedings Paper

Monolithic integrated optical device
Author(s): S. D. Kiyashko; Alexander M. Kamuz; E. U. Ovsyannikov; Pavel F. Oleksenko; Oksana N. Stril'chuk
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Paper Abstract

The integrated optical monolithic device which transforms the optical signal on electrical signal has been manufactured by means of new simple technology. This technology offers to consistently make taper channel waveguide, channel waveguide, and diffractive grating by means of a changing of the refractive index of planar CdSSe waveguide by surface-absorbed laser emission. In order to measure optical signal in channel waveguide the local waveguide photoresistor which has a good photosensitivity in the red wavelength range was formed on its surface. The ratio of dark resistance to resistance under illumination is 102 - 103.

Paper Details

Date Published: 10 December 1993
PDF: 3 pages
Proc. SPIE 2108, International Conference on Holography, Correlation Optics, and Recording Materials, (10 December 1993); doi: 10.1117/12.165424
Show Author Affiliations
S. D. Kiyashko, Institute of Physics of Semiconductors (Ukraine)
Alexander M. Kamuz, Institute of Physics of Semiconductors (Ukraine)
E. U. Ovsyannikov, Institute of Physics of Semiconductors (Ukraine)
Pavel F. Oleksenko, Institute of Physics of Semiconductors (Ukraine)
Oksana N. Stril'chuk, Institute of Physics of Semiconductors (Ukraine)


Published in SPIE Proceedings Vol. 2108:
International Conference on Holography, Correlation Optics, and Recording Materials
Oleg V. Angelsky, Editor(s)

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