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Proceedings Paper

Properties of multilayer and graded index Si-based coatings deposited in dual-frequency plasma
Author(s): Daniel Poitras; Jolanta Ewa Klemberg-Sapieha; A. Moussi; Ludvik Martinu
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Paper Abstract

Optical properties of silicon-based coatings are investigated in which the refractive index n is varied gradually (SiOxNy with continuously changing x and y) or in discrete steps (SiO2/SiN1.3 multilayers). The films are prepared at room temperature in a dual- mode microwave/radiofrequency (MW/RF) plasma in which the substrates are placed on an RF powered substrate holder, while simultaneously exposed to a MW discharge. The films' composition is controlled by the working gas mixture using SiH4, NH3 and N2O, and their microstructure, such as packing density and interface roughness, is controlled independently by varying the energy and the flux of bombarding ions. The deposition process is monitored in-situ by optical emission spectroscopy measurements which are related to the compositional depth profiles provided by elastic recoil detection analysis.

Paper Details

Date Published: 2 November 1993
PDF: 10 pages
Proc. SPIE 2046, Inhomogeneous and Quasi-Inhomogeneous Optical Coatings, (2 November 1993); doi: 10.1117/12.163547
Show Author Affiliations
Daniel Poitras, Ecole Polytechnique de Montreal (Canada)
Jolanta Ewa Klemberg-Sapieha, Ecole Polytechnique de Montreal (Canada)
A. Moussi, Unite de Developpment de la Technologie du silicum (Algeria)
Ludvik Martinu, Ecole Polytechnique de Montreal (Canada)

Published in SPIE Proceedings Vol. 2046:
Inhomogeneous and Quasi-Inhomogeneous Optical Coatings
Jerzy A. Dobrowolski; Pierre G. Verly, Editor(s)

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