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Proceedings Paper

Statistical experimental design on the optimization of high-performance photoresist
Author(s): Stanley A. Ficner; Ping-Hung Lu; Thomas Kloffenstein; Hans-Joachim Merrem
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Paper Abstract

The ultimate photolithographic performance of a photoresist is essentially determined by the nature and relative concentration of the chemical components in the formulation and the process conditions selected. To meet the stringent performance requirements demanded by the advanced microlithography technology, each individual constituent of the photoresist process described must be optimized simultaneously. This study presents an effective and time saving approach using experimental design techniques to address the complicated multi-variable of resist formulation and process condition optimization. The responses for the design experiment in terms of lithographic performance were: exposure and focus latitude, photosensitivity and resist pattern thermal flow temperature are correlated with the resin dissolution characteristics, relative photosensitizer concentration, pre- and postexposure bake temperatures and development time.

Paper Details

Date Published: 15 September 1993
PDF: 11 pages
Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993);
Show Author Affiliations
Stanley A. Ficner, Hoechst Celanese Corp. (United States)
Ping-Hung Lu, Hoechst Celanese Corp. (United States)
Thomas Kloffenstein, Hoechst Celanese Corp. (United States)
Hans-Joachim Merrem, Hoechst Celanese Corp. (United States)

Published in SPIE Proceedings Vol. 1925:
Advances in Resist Technology and Processing X
William D. Hinsberg, Editor(s)

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