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Proceedings Paper

Effect of surface inhibition on process latitudes
Author(s): Casper A. H. Juffermans; Han J. Dijkstra; Yvonne Verhulst-van Hout
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Paper Abstract

In extending the latitudes of high-contrast positive i-line resists both bulk development contrast and surface inhibition are important. Measurements of these parameters with a DRM show large variations when the resist thickness and baking conditions are varied. The relative importance of both contributions on especially the focus latitude are studied. Using the measurements of bulk contrast and surface inhibition time our i-line resist processing is optimized.

Paper Details

Date Published: 15 September 1993
PDF: 10 pages
Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); doi: 10.1117/12.154788
Show Author Affiliations
Casper A. H. Juffermans, Philips Research Labs. (Netherlands)
Han J. Dijkstra, Philips Research Labs. (Netherlands)
Yvonne Verhulst-van Hout, Philips Research Labs. (Netherlands)

Published in SPIE Proceedings Vol. 1925:
Advances in Resist Technology and Processing X
William D. Hinsberg, Editor(s)

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