Share Email Print

Proceedings Paper

Delay-time effects between exposure and post-exposure bake in acetal-based deep-UV photoresists
Author(s): Horst Roeschert; Charlotte Eckes; Hajime Endo; Yoshiaki Kinoshita; Takanori Kudo; Seiya Masuda; Hiroshi Okazaki; Munirathna Padmanaban; Klaus Juergen Przybilla; Walter Spiess; Natusmi Suehiro; Horst Wengenroth; Georg Pawlowski
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

This paper presents some methods for the investigation of delay time I3 induced effects typical of an advanced acetal-based photoresist, and strategies to improve the latent image stability. Dissolution rate monitoring was used to investigate the increasing formation of a surface inhibition layer with extended intervals I3. The impact of certain additives, the application of a protective coating (AZR Aquatar), and modified process conditions on the inhibition layer were studied in detail. The photoacid induced acetal cleavage was monitored by UV-spectroscopy (248 nm). Upon KrF excimer laser irradiation the resist absorbance increases, due to the progressing formation of a strongly absorbing aldehyde fragment. SEM pictures confirm a linear relationship between the efficiency of the acetal cleavage and acid diffusion into unexposed resist areas. Acid evaporation during PEB was determined by a novel method, the so-called Sandwich `Blue' Test. Interpretations of the experimental results and some optimization strategies are given.

Paper Details

Date Published: 15 September 1993
PDF: 17 pages
Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); doi: 10.1117/12.154753
Show Author Affiliations
Horst Roeschert, Hoechst AG (Germany)
Charlotte Eckes, Hoechst AG (Germany)
Hajime Endo, Hoechst Japan Ltd. (Japan)
Yoshiaki Kinoshita, Hoechst Japan Ltd. (Japan)
Takanori Kudo, Hoechst Japan Ltd. (Japan)
Seiya Masuda, Hoechst Japan Ltd. (Japan)
Hiroshi Okazaki, Hoechst Japan Ltd. (Japan)
Munirathna Padmanaban, Hoechst Japan Ltd. (Japan)
Klaus Juergen Przybilla, Hoechst Japan Ltd. (Japan)
Walter Spiess, Hoechst AG (Germany)
Natusmi Suehiro, Hoechst Japan Ltd. (Japan)
Horst Wengenroth, Hoechst AG (Germany)
Georg Pawlowski, Hoechst AG (Germany)

Published in SPIE Proceedings Vol. 1925:
Advances in Resist Technology and Processing X
William D. Hinsberg, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?